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Lith film mask installed at the film plane.

Experimenting with film plane masks. Positive and negative lith film from an art project in the 1990s were placed in the camera and the film was exposed twice. The registration is not exact, I'm not sure whether to pursue this technique further. Zeiss Ikon Nettar 517 with Fomapan 100 film developed in Rodinal 1:50 for 7 mins at 22 degrees.

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Uploaded on August 8, 2024
Taken on July 7, 2024