From one silicon loop to another
Created at Brookhaven Lab's Center for Functional Nanomaterials, this is a loop pattern created on a silicon wafer using E-beam lithography followed by etching. Characterized using atomic force microscopy (AFM).
Dimensions of the pattern: Individual Line width: 100 nm; Total loop size: 700 X 800 nm; Distance between the loops: 110 nm; Height: 90 nm, Image size is 2.5 X 2.5 um.
From one silicon loop to another
Created at Brookhaven Lab's Center for Functional Nanomaterials, this is a loop pattern created on a silicon wafer using E-beam lithography followed by etching. Characterized using atomic force microscopy (AFM).
Dimensions of the pattern: Individual Line width: 100 nm; Total loop size: 700 X 800 nm; Distance between the loops: 110 nm; Height: 90 nm, Image size is 2.5 X 2.5 um.